Fotomaska jest płytą na której znajdują się obszary nieprzezroczyste i przezroczyste (tzw. okna) i służy do naświetlania wzorów w procesie fotolitografii.
https://pl.wikipedia.org/wiki/Fotomaska

photoresist
fotomaska (materiał wrażliwy na światło, używany w procesach przemysłowych)
https://www.diki.pl/slownik-angielskiego?q=fotomaska

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Note added at 26 mins (2018-01-13 02:41:42 GMT)
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In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.
https://en.wikipedia.org/wiki/Resist_(semiconductor_fabricat...

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Note added at 28 mins (2018-01-13 02:44:14 GMT)
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resist material sensitive to irradiation i.e. changes its chemical properties when irradiated; in the form of thin film used as a pattern transfer layer in lithographic processes in semiconductor manufacturing.
photoresist photo-sensitive material used in photolithography to transfer pattern from the mask onto the wafer; a liquid deposited on the surface of the wafer as a thin film then solidified by low temperature anneal; in the areas in which photoresist can be reached by UV radiation photochemical reactions change its properties, specifically, solubility in the developer; two types of photoresist: positive and negative.
http://www.semi1source.com/glossary/default.asp?searchterm=r...